PMGI and LOR resists

"LOR and PMGI lift-off resists are based on polydimethylglutarimide (PMGI) polymers and are well suited for a variety of critical and non-critical level lift-off processes. This includes very high resolution metallization (<0.25µm), as well as very thick (> 3µm) metallization."

Applications

PMGI and LOR resists enable high yield, metal lift-off processing in a variety of applications from data storage and wireless ICs, to MEMS

Technical Specifications