Mutech microsystems microlaser is an affordable direct laser lithography writer, oriented to universities and research facilities looking to entering into micro or nano electronics.
Lithographic System
Applications
- Direct laser lithography greatly reduces costs and execution
times in areas such as - microfluidics,
- microelectronics,
micromechanics - and material science research, by
- eliminating the dependence of external suppliers to produce photomasks.
Technical Specifications
XY stage Typical writing speed 100-120 mm/s Maximum area 100x92 mm^2 Unidirectional positioning step X = 0.16 µm, Y = 1.00 µm Mechanical noise on the X and Y axis < 1 µm Multi layer aligning accuracy 5-10 µm (Optional rotary stage for easier aligning) Realistic minimum feature size: 6-15µm depending on the feature
Software Supported formats PNG,GDSII In-software transformations Rotation, Reflection, Inversion, Rescaling, Add border Multiple designs from different files can be written in one process Tilted/warped substrate compensation via 3-point linear or 4-point bilinear focus measurement Mesh type calibration for full-bed curvature compensation Unidirectional or bidirectional writing modes
Optics Laser wavelength 405nm (Optional 375nm) Confocal microscope for laser focusing, aligning and inspection Secondary independent yellow illumination Laser spot size can be changed using industry standard microscope objectives Included objectives
Raster step Speed on big areas (unidirectional) Fine 0.8 µm 1.7 mm^2/min Medium-fine 0.96 µm 2.04 mm^2/min Medium 2 µm 4.25 mm^2/min Coarse 5 µm 10.6 mm^2/min Speed doubles in bidirectional writing mode
