"EBR PG is specifically formulated to quickly and cleanly remove edge beads that buildup during the spin coat process. Edge bead removal is performed immediately after spin coat by directing a stream of EBR PG near the edge of the wafer while it is spinning."


EBR PG is more versatile as its use is not only restricted to edge bead removal of Photoresist, but it is also effective for use with antireflective coatings

Technical Specifications