PHOTORESISTS - Thin Positive Photoresists - Positive Thin Photoresists | Materials


Overview of our Thin Positive Photoresists

  • Both photoresists are based on a similar chemistry. Besides the standard constituents novolak and naphthoquinone diazide, they contain a special additive which results in unique properties:
  •  These resists exhibit extremely good adhesion on almost any surface like glass, oxides, highly doped oxides, metals etc. This feature makes them a good choice for wet-etching.
  • They are less brittle than other positive photoresists.

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