PHOTORESISTS | Lift-Off Resists(LOR) - PMGI & LOR Materials


  • PMGI and LOR resists enable high yield, metal lift-off processing in a variety of applications from data storage and wireless ICs, to MEMS.
  • Used beneath photoresists in a bi-layer stack, PMGI and LOR extend the limits of lift-off processing beyond where single layer resist strategies can reach.
  • This includes very high resolution metallization (<0.25µm), as well as very thick (>4µm) metallization.
  • These unique materials are available in a variety of formularies to meet virtually any customer need.

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