PHOTORESISTS - E-BEAM RESISTS - mr-PosEBR | Materials

mr-PosEBR-Positive Tone Electron-Beam Resist Series

  • Acrylate-based positive tone resist for high resolution e-beam lithography
  • Highly sensitive
  • High dry etch resistance for pattern transfer
  • Suitable for 3D surface patterning
  • Safer solvent anisole

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