Materials - PHOTORESISTS - SU-8 2000 |


SU-8 2000

  • SU-8 2000 chemically amplified, i-Line resists are well-suited for the fabrication of permanent device structures.
  • These negative tone, epoxy based resists exhibit excellent chemical resistance and low Young’s Modulus which makes them ideal for fabricating micro/nano structures such as cantilevers, membranes, and microchannels.

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