PHOTORESISTS - Lift-Off Resists(LOR) - PMMA Positive resists | Materials

PMMA Positive resists

  • PMMA (polymethyl methacrylate) is a versatile polymeric material that is well-suited for many imaging and non-imaging microelectronic applications.
  • PMMA resists are simply PMMA polymer dissolved in a solvent like anisole (safe solvent).
  • Copolymer resists are based on a mixture of PMMA and ~8.5% methacrylic acid.
  • Copolymer MMA (8.5) MAA is commonly used in combination with PMMA in bi-layer lift-off resist process where independent control of CD size and shape of each resist layer is required.


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