Materials - PHOTORESISTS - SU-8 |


  • SU-8 is a high contrast
  • epoxy-based photoresist designed for micromachining and other microelectronic applications where a thick chemically and thermally stable image is desired.
  • The exposed and subsequently cross-linked portions of the film are rendered insoluble to liquid developers.
  • SU-8 has very high optical transparency above 360nm, which makes it ideally suited for imaging near vertical sidewalls in very thick films.
  • SU-8 is best suited for permanent applications where it is imaged, cured and left in place.

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