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Electronic Grade Chemicals
Evaporation Materials and Boats
Solid Dopant Sources
Glass to Metal Packages
Ceramic to Metal Packages
Negative photoresist series well suited for e-beam and deep UV exposure in the manufacturing of semiconductor devices.
Mfr: KAYAKU (MICROCHEM)
Acrylate-based positive tone resist for high resolution e-beam lithography
PMMA (polymethyl methacrylate) is a versatile polymeric material that is well-suited for many imaging and non-imaging microelectronic applications,
Copolymer resists are based on a mixture of PMMA and ~8.5% methacrylic acid.
PMGI and LOR resists enable high yield, metal lift-off processing in a variety of applications from data storage and wireless ICs, to MEMS.
Thick Positive Resists
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